Nano-Patterned Sapphire Substrate, NPSS

Nano-Patterned Sapphire Substrate, NPSS

從自動化關鍵零組件的單軸模組,傳動元件,運動控制卡,軟體研發,到自動化設備應用規劃及研發客制,如產業機器人,機器手臂,PCB切割機,SMT制程設備,LED/半導體制程設備,光通訊設備,自動光學檢測AOI設備和椿科技提供一貫且完整的解決方案。

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Nano-Patterned Sapphire Substrate,  NPSS

Nano-Patterned Sapphire
奈米圖案化藍寶石基板
奈米圖案化藍寶石基板
Product
Specification
Product

The periodic sapphire nano-structure is fabricated by etching technology, carriers for gallium nitride glowing and world wide material for high brightness blue light emitting diode.

Advantages of nano patterned sapphire substrate (NPSS):​​​​​​​

  • Enhance the light extraction of LED.
  • Improve the electrical performance of LED.

 

Advantages of NPSS than PSS​​​​​​​:

  • High uniformity of sub-micro structure patterned by nano-imprinting.
  • Increase throughput of dry etching and epitaxy equipment.
Specification
Project
Specification
Orientation
Surface Orientation : C-plain (0001)
Orientation Flat : A-plane (11-20)
Wafer Size
Diameter : 50.8 +/- 0.2 mm
Thickness : 430 +/- 25 mm
Front Surface(Pattern Size)
Pitch: 1000nm
Height: 600nm
Bottom Diameter: 900nm
Arrangement : Trigonal
Back Surface
Finishing : Fine Ground